Positive pulse bias method in plasma-based ion implantation
Author:
Publisher
Elsevier BV
Subject
Instrumentation,Nuclear and High Energy Physics
Reference5 articles.
1. Sheath thickness and potential profiles of ion‐matrix sheaths for cylindrical and spherical electrodes
2. Model of plasma immersion ion implantation
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4. Plasma Diagnostic Techniques;Chen,1965
5. Measurement of electron emission due to energetic ion bombardment in plasma source ion implantation
Cited by 4 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Positive-plasma-bias method for plasma-based ion implantation and deposition;Surface and Coatings Technology;2010-06
2. Measurement of ion current distribution on a three-dimensional workpiece in the positive pulse bias PBII;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;2006-01
3. Positive pulse bias method for a high-throughput PBII processing system;Surface and Coatings Technology;2004-08
4. A New Trend of Plasma-Based Ion Implantation and Deposition;Journal of Plasma and Fusion Research;2004
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