Measurement of electron emission due to energetic ion bombardment in plasma source ion implantation
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.349067
Reference16 articles.
1. Plasma source ion‐implantation technique for surface modification of materials
2. Plasma source ion implantation: A new, cost-effective, non-line-of-sight technique for ion implantation of materials
3. Electron Ejection from Solids by Atomic Particles with Kinetic Energy
Cited by 111 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献
1. Controlling plasma-based surface modifications of an austenitic alloy by thermochemical and athermal diffusions;Journal of Alloys and Compounds;2024-04
2. Electron Source with Plasma Emitters Based on Low-Pressure Arc Discharge;Bulletin of the Russian Academy of Sciences: Physics;2023-12
3. Spatiotemporal Dynamics of a Low-Pressure Arc and a Generated Beam in an Electron Source with a Grid Plasma Emitter;High Temperature;2022-08
4. Time-resolved evolution of plasma parameters in a plasma immersion ion implantation source;Physics of Plasmas;2021-12
5. Analysis of the concentration of nitrogen and titanium ions simultaneously implanted into chromium-molybdenum low-alloy carbon steel;Journal of Physics: Conference Series;2021-10-01
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线,采集、加工和组织学术论文而形成的新型学术文献查询和分析系统,可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容,当前同舟云学术共收录了国内外主流学术期刊6万余种,收集的期刊论文及会议论文总量共计约1.5亿篇,并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询!咨询电话:010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3