Surface metal contamination on silicon wafers after hydrogen plasma immersion ion implantation
Author:
Publisher
Elsevier BV
Subject
Instrumentation,Nuclear and High Energy Physics
Reference13 articles.
1. J.P. Colinge, Silicon-on-Insulator Techonology: Materials to VLSI, Kluwer Academic Publishers, Boston, MA, 1991
2. S. Cristoloveanu, S.S. Li, Electrical Characterization of Silicon-on-Insulator materials and Devices, Kluwer Academic Publishers, Boston, 1995
3. Plasma immersion ion implantation—a fledgling technique for semiconductor processing
4. Plasma immersion ion implantation for semiconductor processing
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