Plasma immersion ion implantation for semiconductor processing
Author:
Publisher
Elsevier BV
Subject
Condensed Matter Physics,General Materials Science
Reference45 articles.
1. Model of plasma immersion ion implantation
2. Analytical modeling of plasma immersion ion implantation target current using the SPICE circuit simulator
3. Electron emission from glow‐discharge cathode materials due to neon and argon ion bombardment
4. Comparison of experimental target currents with analytical model results for plasma immersion ion implantation
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