Study of sheath properties in collisional plasma consisting of non-extensive electrons and thermal ions
Author:
Publisher
Elsevier BV
Subject
General Medicine
Reference21 articles.
1. Principles of Plasma Discharges and Materials Processing;Liebermann,1994
2. Plasma immersion ion implantation for semiconductor processing
3. Ion implantation by plasma immersion: interest, limitations and perspectives
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1. Sheath structure behavior in collisional non-extensive plasma with negative ions;The European Physical Journal Plus;2024-05-03
2. Influence of Tsallis q-entropy on occurrence scattering time in a nonextensive plasma;Physica Scripta;2023-12-26
3. Modeling of magnetized collisional plasma sheath with nonextensive electron distribution and ionization source;Plasma Science and Technology;2023-01-19
4. Ion source terms effect on collisional plasma sheath characteristics with non-extensively distributed electrons;The European Physical Journal Plus;2020-08
5. Influence of ionization on sheath structure in electropositive warm plasma carrying two-temperature electrons with non-extensive distribution;Physics of Plasmas;2020-06
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