The initial mechanisms of Al2O3 atomic layer deposition on OH/Si(100)-2×1 surface by tri-methylaluminum and water
Author:
Publisher
Elsevier BV
Subject
Physical and Theoretical Chemistry,General Physics and Astronomy
Reference28 articles.
1. Atomic layer deposition (ALD): from precursors to thin film structures
2. Atomic Layer Deposition of Oxide Thin Films with Metal Alkoxides as Oxygen Sources
3. Surface Chemistry for Atomic Layer Growth
4. A Quantum Chemical Study of the Atomic Layer Deposition of Al2O3 Using AlCl3 and H2O as Precursors
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