Accelerated Deep Learning Dynamics for Atomic Layer Deposition of Al(Me)<sub>3</sub> and Water on OH/Si(111)-Reference-Cited by-同舟云学术

登录注册会员服务联系我们

Accelerated Deep Learning Dynamics for Atomic Layer Deposition of Al(Me)₃ and Water on OH/Si(111)

Published:2022-05-24 Issue:22 Volume:14 Page:26116-26127
ISSN:1944-8244
Container-title:ACS Applied Materials & Interfaces
language:en
Short-container-title:ACS Appl. Mater. Interfaces

Author:

Nakata Hiroya¹,Filatov(Gulak) Michael¹^ORCID,Choi Cheol Ho¹^ORCID

Affiliation:

1. Department of Chemistry, Kyungpook National University, Daegu 41566, South Korea

Funder

National Research Foundation of Korea

Korea Polar Research Institute

Samsung Science and Technology Foundations

Publisher

American Chemical Society (ACS)

Subject

General Materials Science

Link

https://pubs.acs.org/doi/pdf/10.1021/acsami.2c01768

Reference60 articles.

1. Atomic Layer Deposition: An Overview

2. A brief review of atomic layer deposition: from fundamentals to applications

3. New development of atomic layer deposition: processes, methods and applications

4. Investigation of the initial deposition steps and the interfacial layer of Atomic Layer Deposited (ALD) Al2O3 on Si

5. Review Article: Atomic layer deposition for oxide semiconductor thin film transistors: Advances in research and development

Cited by 6 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Adsorption of dimethylaluminum isopropoxide (DMAI) on the Al2O3 surface: A machine-learning potential study;Journal of Science: Advanced Materials and Devices;2024-09

2. A machine learning approach for the estimation of photocatalytic activity of ALD ZnO thin films on fabric substrates;Journal of Photochemistry and Photobiology A: Chemistry;2024-02

3. Enhancement of Conformality of Silicon Nitride Thin Films by ABC‐Type Atomic Layer Deposition;Advanced Electronic Materials;2023-12-18

4. Data Efficient and Stability Indicated Sampling for Developing Reactive Machine Learning Potential to Achieve Ultralong Simulation in Lithium-Metal Batteries;The Journal of Physical Chemistry C;2023-12-13

5. Applications and Advances in Machine Learning Force Fields;Journal of Chemical Information and Modeling;2023-09-26

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370

www.globalauthorid.com

TOP

Copyright © 2019-2024 北京同舟云网络信息技术有限公司
京公网安备11010802033243号京ICP备18003416号-3