The influence of gate underlap on analog and RF performance of III–V heterostructure double gate MOSFET

Author:

Sarkar Angsuman,Jana Rohit

Publisher

Elsevier BV

Subject

Electrical and Electronic Engineering,Condensed Matter Physics,General Materials Science

Cited by 38 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

1. Analysis on performances of ultra-thin vertical MOSFET depending on position of gate–drain misalignment;Japanese Journal of Applied Physics;2024-05-01

2. Exploration and Analysis of Temperature and Performance of Compound Semiconductor-Based Junctionless GAA FET;IEEE Access;2024

3. Electrical Characteristic analysis of Gate Underlap Strain Channel Cylindrical GAA FET;2023 7th International Conference on Electronics, Materials Engineering & Nano-Technology (IEMENTech);2023-12-18

4. Design and Simulation of Gate Underlap Strained Cylindrical GAA with High-K Gate Stack;2023 IEEE 3rd International Conference on Applied Electromagnetics, Signal Processing, & Communication (AESPC);2023-11-24

5. Small-Signal Modeling of GaN-BTG MOSFET for Wireless Applications;Wireless Personal Communications;2023-08-22

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