Roadmap for 22nm and beyond (Invited Paper)-Reference-Cited by-同舟云学术

Roadmap for 22nm and beyond (Invited Paper)

Published:2009-07 Issue:7-9 Volume:86 Page:1520-1528
ISSN:0167-9317
Container-title:Microelectronic Engineering
language:en
Short-container-title:Microelectronic Engineering

Author:

Iwai H.

Publisher

Elsevier BV

Subject

Electrical and Electronic Engineering,Surfaces, Coatings and Films,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Reference16 articles.

1. Design of ion-implanted MOSFET's with very small physical dimensions

2. Trend of CMOS downsizing and its reliability

3. .

4. H. Iwai, SC, in: IEDM, 2008.

5. A study on hot carrier effects on N-MOSFETs under high substrate impurity concentration

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