Manufacturing of XEUV mirrors with a sub-nanometer surface shape accuracy-Reference-Cited by-同舟云学术

Manufacturing of XEUV mirrors with a sub-nanometer surface shape accuracy

Published:2009-05 Issue:1-2 Volume:603 Page:62-65
ISSN:0168-9002
Container-title:Nuclear Instruments and Methods in Physics Research Section A: Accelerators, Spectrometers, Detectors and Associated Equipment
language:en
Short-container-title:Nuclear Instruments and Methods in Physics Research Section A: Accelerators, Spectrometers, Detectors and Associated Equipment

Author:

Chkhalo N.I.,Kluenkov E.B.,Pestov A.E.,Polkovnikov V.N.,Raskin D.G.,Salashchenko N.N.,Suslov L.A.,Toropov M.N.

Publisher

Elsevier BV

Subject

Instrumentation,Nuclear and High Energy Physics

Reference13 articles.

2. D.M. Williamson, OSA Proceedings on Extreme Ultraviolet Lithography, vol. 23, 1995, p. 68.

3. M.A. Okatov, E.A. Antonov, A. Baygogin, et al., Directory of technologist-optic, SPb, Polytehnika (2004) (in Russian).

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