Evaluation of probe lasers employed in optical diagnostics for phase transformation of thin films during excimer laser crystallization
Author:
Publisher
Elsevier BV
Subject
Electrical and Electronic Engineering,Mechanical Engineering,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials
Reference26 articles.
1. Time‐resolved ellipsometry measurements of the optical properties of silicon during pulsed excimer laser irradiation
2. In situ and ex situ diagnostics on melting and resolidification dynamics of amorphous and polycrystalline silicon thin films during excimer laser annealing
3. Phase transformation mechanisms involved in excimer laser crystallization of amorphous silicon films
4. Direct observation of resolidification from the surface upon pulsed‐laser melting of amorphous silicon
5. Excimer laser-induced temperature field in melting and resolidification of silicon thin films
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1. Repeatability and reproducibility study of thin film optical measurement system;Optik - International Journal for Light and Electron Optics;2013-09
2. Rapid optical measurement of surface texturing result of crystalline silicon wafers for high efficiency solar cells application;Optik;2012-02
3. A New Approach to Characterizing Surface Texturing of Crystalline Silicon Wafers for High Efficiency Solar Cells Application;Journal of Laser Micro/Nanoengineering;2011-12
4. A novel optical diagnostic technique for analyzing the recrystallization characteristics of polycrystalline silicon thin films following frontside and backside excimer laser irradiation;Optics and Lasers in Engineering;2011-11
5. A New Optical Technique for Surface Roughness Measurement of Tio2 Thin Films;Applied Mechanics and Materials;2011-10-24
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