Combination of ultraviolet exposure and thermal post-treatment to obtain high quality HfO2 thin films
Author:
Funder
Samsung
Publisher
Elsevier BV
Subject
Materials Chemistry,Surfaces, Coatings and Films,Process Chemistry and Technology,Ceramics and Composites,Electronic, Optical and Magnetic Materials
Reference37 articles.
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3. First-principles calculations of electronic and optical properties of Ti-doped monoclinic HfO2;Tan;J. Alloys Compd.,2011
4. Thermal stability of hafnium and hafnium nitride gates on HfO2 gate dielectrics;Tsai;J. Alloys Compd.,2009
5. Comparison between Al2O3 thin films grown by ALD using H2O or O3 as oxidant source;Campabadal,2011
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