Studies of thin-film growth of sputtered hydrogenated amorphous silicon-Reference-Cited by-同舟云学术

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Studies of thin-film growth of sputtered hydrogenated amorphous silicon

Published:1982-11 Issue:1-3 Volume:8 Page:187-204
ISSN:0165-1633
Container-title:Solar Energy Materials
language:en
Short-container-title:Solar Energy Materials

Author:

Moustakas T.D.

Publisher

Elsevier BV

Subject

General Engineering

Reference25 articles.

1. Hydrogenated amorphous silicon carbide as a window material for high efficiency a-Si solar cells

2. Characterized of glow-discharge deposited a-Si:H

3. Recent developments in amorphous silicon solar cells

4. Hydrogen elimination during the glow‐discharge deposition ofa‐Si:H alloys

5. Microstructure of plasma‐deposited a‐Si : H films

Cited by 60 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Demonstration of Excellent Crystalline Silicon Surface Passivation (S < 1.27 cm s⁻¹) by High‐Rate DC‐Sputtered Hydrogenated Amorphous Silicon;Solar RRL;2024-02-27

2. Effect of Superimposed DC Power on the Properties of Intrinsic Hydrogenated Amorphous Silicon Passivation Layer Deposited by RF Facing Target Sputtering;IEEE Journal of Photovoltaics;2020-07

3. The influence of Ar pressure on the structure and optical properties of non-hydrogenated a-Si thin films grown by rf magnetron sputtering onto room-temperature glass substrates;Journal of Non-Crystalline Solids;2019-08

4. Effect of RF power on the properties of intrinsic hydrogenated amorphous silicon passivation layer deposited by facing target sputtering;Applied Physics Express;2018-01-31

5. Characterisation of amorphous molybdenum silicide (MoSi) superconducting thin films and nanowires;Superconductor Science and Technology;2017-07-12

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