1. Surface chemistry of atomic layer deposition: a case study for the trimethylaluminum/water process (review article);Puurunen;J. Appl. Phys.,2005
2. Atomic-layer deposition of wear-resistant coatings for microelectromechanical devices;Mayer;Appl. Phys. Lett.,2003
3. A.M. Shevjakov, G.N. Kuznetsova, V.B. Aleskovskii, Interaction of titanium and germanium tetrachlorides with hydroxylated silicon dioxide, in: Proceedings of 2nd USSR Conference on High Temperature Chemistry of Oxides, November 26–29, 1965, Leningrad, USSR: Nauka, 1967, pp. 149–155 (in Russian).
4. T. Suntola, J. Antson, Method for producing compound thin films, US Patent 4 058 430, November 15, 1977.
5. 3D micromechanical compass;Kyynäräinen;Sensor Lett.,2007