Ellipsometric, XPS and FTIR study on SiCN films deposited by hot-wire chemical vapor deposition method
Author:
Publisher
Elsevier BV
Subject
Mechanical Engineering,Mechanics of Materials,Condensed Matter Physics,General Materials Science
Reference17 articles.
1. Deposition of SiCN films using organic liquid materials by HWCVD method
2. Evaluation of corrosion resistance of SiCN films deposited by HWCVD using organic liquid materials
3. Effect of thermal annealing on the properties of a-SiCN:H films by hot wire chemical vapor deposition using hexamethyldisilazane
4. Study of structural and electronic environments of hydrogenated amorphous silicon carbonitride (a-SiCN:H) films deposited by hot wire chemical vapor deposition
5. Deposition of silicon carbon nitride thin films by microwave ECR plasma enhanced unbalance magnetron sputtering
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4. Theoretical Study on the Decomposition Kinetics and Thermochemistry of Tetramethyldisilazane and Hexamethyldisilazane─Formation of Silanimine and Silene Species;The Journal of Physical Chemistry A;2022-10-31
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