Effect of thermal annealing on the properties of a-SiCN:H films by hot wire chemical vapor deposition using hexamethyldisilazane

Author:

Limmanee Amornrat,Otsubo Michio,Sugiura Tsutomu,Sato Takehiko,Miyajima Shinsuke,Yamada Akira,Konagai Makoto

Publisher

Elsevier BV

Subject

Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials

Reference9 articles.

1. IR-study of a-SiCx:H and a-SiCxNy:H films for c-Si surface passivation

2. Deposition of SiCN films using organic liquid materials by HWCVD method

3. Proceeding of 15th International Photovoltaic Science and Engineering Conference, Shanghai, China, October 10–15;Otsubo,2005

4. Proceeding of IEEE 4th World Conference on Photovoltaic Energy Conversion, Hawai, U.S.A, May 7–12;Limmanee,2006

5. Characterization of Si wafers by μ-PCD with surface electric field

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