Deposition of SiCN films using organic liquid materials by HWCVD method
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials
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1. Large‐band‐gap SiC, III‐V nitride, and II‐VI ZnSe‐based semiconductor device technologies
2. Recent developments in SiC single-crystal electronics
3. Characteristics of Si$z.sbnd;C$z.sbnd;N films deposited by microwave plasma CVD on Si wafers with various buffer layer materials
4. Deposition and optical studies of silicon carbide nitride thin films
5. Crystalline silicon carbon nitride: A wide band gap semiconductor
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