First-principles investigations and MOCVD growth of Si-doped β-Ga2O3 thin films on sapphire substrates for enhancing Schottky barrier diode characteristics

Author:

Singh Anoop Kumar,Yen Chao-Chun,Huang Chiung-Yi,Tarntair Fu-Gow,Chou Hsin-Yu,Huang Shi-Min,Yadlapalli Bharath Kumar,Horng Ray-Hua,Wuu Dong-SingORCID

Funder

National Applied Research Laboratories

National Science and Technology Council

Publisher

Elsevier BV

Reference47 articles.

1. Perspective: Ga2O3 for ultra-high power rectifiers and MOSFETS;Pearton;J. Appl. Phys.,2018

2. A review of gallium oxide-based power Schottky barrier diodes;Ji;J. Phys. D Appl. Phys.,2022

3. Nitrogen-doped β-Ga2O3 vertical transistors with a threshold voltage of ≥1.3 V and a channel mobility of 100 cm2V−1s−1;Wakimoto;APEX,2023

4. Identification of critical buffer traps in Si δ-doped β-Ga2O3 MESFETs;McGlone;Appl. Phys. Lett.,2019

5. Fabrication of a Nb-doped β-Ga2O3 nanobelt field-effect transistor and its low-temperature behavior;Chen;ACS Appl. Mater. Interfaces,2020

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