Process control of magnetron sputtering of TiN coatings studied by in situ AES and plasma diagnostics
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry
Reference16 articles.
1. Magnetron sputtering: basic physics and application to cylindrical magnetrons
2. Kalte Plasmen;Franz,1990
3. Sputter cleaning of iron substrates and contamination of TiN coatings studied by in situ Auger electron spectroscopy measurements in an ultrahigh vacuum physical vapour deposition apparatus
4. Investigations of partial reactions during magnetron sputtering of TiN coatings by in situ Auger electron spectroscopy analysis and plasma diagnostics
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1. Experiments and kinetic modeling of the ion energy distribution function at the substrate surface during magnetron sputtering of silver targets in radio frequency argon plasmas;Journal of Vacuum Science & Technology A;2019-03
2. Characterization of aluminum and titanium nitride films prepared by reactive sputtering under different poisoning conditions of target;Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films;2017-11
3. Effect of substrate temperature and annealing on structure, stress and properties of reactively co-sputtered Ni-TiN nanocomposite thin films;Thin Solid Films;2017-02
4. Effect of Ar:N2 ratio on structure and properties of Ni–TiN nanocomposite thin films processed by reactive RF/DC magnetron sputtering;Surface and Coatings Technology;2013-08
5. Effect of N2 flow rate on structure and property of ZrNbAlNx multilayer films deposited by magnetron sputtering;Journal of Alloys and Compounds;2013-05
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