Experiments and kinetic modeling of the ion energy distribution function at the substrate surface during magnetron sputtering of silver targets in radio frequency argon plasmas
Author:
Affiliation:
1. Département de physique, Université de Montréal, Montréal, Québec H3C 3J7, Canada
Funder
Natural Sciences and Engineering Research Council of Canada
Publisher
American Vacuum Society
Subject
Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics
Link
http://avs.scitation.org/doi/pdf/10.1116/1.5054101
Cited by 5 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献
1. Effect of gas pressure on ion energy at substrate side of Ag target radio-frequency and very-high-frequency magnetron sputtering discharge;Plasma Science and Technology;2022-01-17
2. Grid-Assisted Co-Sputtering Method: Background, Advancement, and Prospect;Plasma Chemistry and Plasma Processing;2021-03-20
3. Diagnostic of Ar-CO2 mixture plasma using a fine-structure resolved collisional radiative model;Spectrochimica Acta Part B: Atomic Spectroscopy;2021-01
4. Large-grained Ag thin films with low electrical resistivity produced by sputtering in Kr gas;Japanese Journal of Applied Physics;2020-03-30
5. Phase-Resolved Measurement of Atmospheric-Pressure Radio-Frequency Pulsed Discharges in Ar/CH4/CO2 Mixture;Plasma Chemistry and Plasma Processing;2020-03-14
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