Effect of Ar:N2 ratio on structure and properties of Ni–TiN nanocomposite thin films processed by reactive RF/DC magnetron sputtering
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry
Reference93 articles.
1. Composite TiN–Ni thin films deposited by reactive magnetron sputter ion-plating
2. Structural and mechanical properties of IBAD deposited nanocomposite Ti–Ni–N coatings
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4. Hard nanocomposite Ti–Cu–N films prepared by d.c. reactive magnetron co-sputtering
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