Hardness and Microstructure of TiN Coating on Aluminum Alloy with DC Sputtering

Abstract

Titanium Nitride coating has attracted much interest in increasing the hardness of aluminum alloys. This study aims to investigate the effect of Ar: N gas mixture and time on increasing the hardness of aluminum alloys using DC sputtering. Preparation of TiN thin films on aluminum alloy substrates using flowing gas mixture parameters and time. First, the layer of TiN was deposited on the sample with a gas mixture of 90Ar:10N; 80Ar:20N; 70Ar:30N; and 60Ar:40N (%) for 60 minutes. Then the optimum gas mixture that produces the highest surface hardness is used in the second process with time variations of 30, 60, 90, and 120 minutes. The results showed that the highest hardness was achieved in a gas mixture of 70Ar:30N and 60 minutes. The TiN phase formed on the aluminum surface was identified by XRD, while the surface morphology was observed by SEM. Compared with untreated samples, the hardness of treated samples increased significantly.