Copper nitride (Cu3N) thin films deposited by RF magnetron sputtering-Reference-Cited by-同舟云学术

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Copper nitride (Cu3N) thin films deposited by RF magnetron sputtering

Published:2006-01 Issue:2 Volume:286 Page:407-412
ISSN:0022-0248
Container-title:Journal of Crystal Growth
language:en
Short-container-title:Journal of Crystal Growth

Author:

Wang J.,Chen J.T.,Yuan X.M.,Wu Z.G.,Miao B.B.,Yan P.X.

Funder

Natural Science Foundation of Gansu Province

Publisher

Elsevier BV

Subject

Materials Chemistry,Inorganic Chemistry,Condensed Matter Physics

Reference23 articles.

1. Cu3N Thin Film for a New Light Recording Media

2. Copper nitride and tin nitride thin films for write‐once optical recording media

3. Growth and properties of Cu3N films and Cu3N/γ′-Fe4N bilayers

4. Growth, structural and optical properties of Cu3N films

5. Preparation of the metastable interstitial copper nitride, Cu4N, by d.c. plasma ion nitriding

Cited by 67 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Effect of substrate temperature and position on properties of Cu3N thin films deposited by reactive radio frequency magnetron sputtering;Materials Science in Semiconductor Processing;2024-11

2. A new technique for synthesis of the Cu3N and its structural indexing;Indian Journal of Physics;2024-04-16

3. Structural, Optical, and Electrical Characteristics of Cu3N with Respect to Substrate Temperature and N2 Concentration in Mixed Sputtering Gas;Arabian Journal for Science and Engineering;2024-01-02

4. Mid-Infrared (MIR) Complex Refractive Index Spectra of Polycrystalline Copper-Nitride Films by IR-VASE Ellipsometry and Their FIB-SEM Porosity;Coatings;2023-12-19

5. Effects of Deposition Temperature and Working Pressure on the Thermal and Nanomechanical Performances of Stoichiometric Cu3N: An Adaptable Material for Photovoltaic Applications;Nanomaterials;2023-11-15

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