Effect of substrate temperature and position on properties of Cu3N thin films deposited by reactive radio frequency magnetron sputtering
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Published:2024-11
Issue:
Volume:182
Page:108702
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ISSN:1369-8001
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Container-title:Materials Science in Semiconductor Processing
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language:en
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Short-container-title:Materials Science in Semiconductor Processing
Author:
Majumder Shanta,
Ohishi Miho,
Saito Katsuhiko,
Guo Qixin,
Patwary Md Abdul Majed,
Tanaka TooruORCID