High-Mobility p-Type and n-Type Copper Nitride Semiconductors by Direct Nitriding Synthesis and In Silico Doping Design-Reference-Cited by-同舟云学术

High-Mobility p-Type and n-Type Copper Nitride Semiconductors by Direct Nitriding Synthesis and In Silico Doping Design

Published:2018-06-19 Issue:31 Volume:30 Page:1801968
ISSN:0935-9648
Container-title:Advanced Materials
language:en
Short-container-title:Adv. Mater.

Author:

Matsuzaki Kosuke¹,Harada Kou²,Kumagai Yu¹,Koshiya Shogo³,Kimoto Koji³,Ueda Shigenori⁴⁵,Sasase Masato¹,Maeda Akihiro²,Susaki Tomofumi¹²,Kitano Masaaki¹,Oba Fumiyasu¹²⁶,Hosono Hideo¹²

Affiliation:

1. Materials Research Center for Element Strategy; Tokyo Institute of Technology; 4259 Nagatsuta-cho, Midori-ku Yokohama 226-8503 Japan

2. Laboratory for Materials and Structures; Institute of Innovative Research; Tokyo Institute of Technology; 4259 Nagatsuta-cho, Midori-ku Yokohama 226-8503 Japan

3. Electron Microscopy Group; Research Center for Advanced Measurement and Characterization; National Institute for Materials Science; 1-1 Namiki Tsukuba Ibaraki 305-0044 Japan

4. Synchrotron X-ray Station at SPring-8; National Institute for Materials Science; 1-1-1 Kouto, Sayo-cho, Sayo-gun Hyogo 679-5148 Japan

5. Research Center for Advanced Measurement and Characterization; National Institute for Materials Science; 1-2-1 Sengen Tsukuba Ibaraki 305-0047 Japan

6. Center for Materials Research by Information Integration; Research and Services Division of Materials Data and Integrated System; National Institute for Materials Science; 1-2-1 Sengen Tsukuba Ibaraki 305-0047 Japan

Funder

MEXT Elements Science and Technology Project and Elements Strategy Initiative to Form Core Research Center

Japan Society for the Promotion of Science

Japan Science and Technology Corporation

Publisher

Wiley

Subject

Mechanical Engineering,Mechanics of Materials,General Materials Science

Link

http://onlinelibrary.wiley.com/wol1/doi/10.1002/adma.201801968/fullpdf

Reference46 articles.

1. Photovoltaic materials: Present efficiencies and future challenges