An inverse-flow showerhead MOVPE reactor design
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Inorganic Chemistry,Condensed Matter Physics
Reference6 articles.
1. Design and operating considerations for a water-cooled close-spaced reactant injector in a production scale MOCVD reactor
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1. Equipment and Manufacturability Issues in Chemical Vapor Deposition Processes;Handbook of Thin Film Deposition;2018
2. Experimental study of the effects of showerhead configuration on large-area silicon-nitride thin film by plasma-enhanced chemical vapor deposition;Thin Solid Films;2017-09
3. Modeling and designing a new gas injection diffusion system for metalorganic chemical vapor deposition;Heat and Mass Transfer;2017-07-21
4. Effect of thermocouple position on temperature field in nitride MOCVD reactor;Journal of Crystal Growth;2013-04
5. Transport Phenomena in a Novel Large MOCVD Reactor for Epitaxial Growth of GaN Thin Films;IEEE Transactions on Semiconductor Manufacturing;2012-02
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