Equipment and Manufacturability Issues in Chemical Vapor Deposition Processes-Reference-Cited by-同舟云学术

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Equipment and Manufacturability Issues in Chemical Vapor Deposition Processes

Published:2018 Issue: Volume: Page:269-316
ISSN:
Container-title:Handbook of Thin Film Deposition
language:
Short-container-title:

Author:

Chow Loren A.

Publisher

Elsevier

Reference238 articles.

1. CVD reactors and delivery system technology;Krumdieck,2009

2. Principles of Chemical Vapor Deposition

3. Sintering, coalescence and compositional changes of hydrogen-terminated silicon nanoparticles as a function of temperature;Holm;J Phys Chem,2009

Cited by 3 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Composites and Materials Prepared from Boron Cluster Anions and Carboranes;Materials;2023-09-06

2. Recent Advances in Development and Characterization of CVD Multilayer Composite Coatings—A Comprehensive Review;Integrated Computer Technologies in Mechanical Engineering - 2022;2023

3. Performance Improvement of Mechanical Components by Precision Coating;Advances in Computer and Electrical Engineering;2020

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