A new method for predicting thermal flow stability: application to a heated rotating disk
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Inorganic Chemistry,Condensed Matter Physics
Reference11 articles.
1. Thermal instability of two-dimensional stagnation-point boundary layers
2. Design and Verification of Nearly Ideal Flow and Heat Transfer in a Rotating Disk Chemical Vapor Deposition Reactor
3. Flow regime map and deposition rate uniformity in vertical rotating-disk OMVPE reactors
4. C. Biber, Ph.D. Thesis, Massachusetts Institute of Technology, 1991.
5. Numerical Analysis of the Transport Phenomena in MOCVD Process
Cited by 2 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Transport Phenomena in a Novel Large MOCVD Reactor for Epitaxial Growth of GaN Thin Films;IEEE Transactions on Semiconductor Manufacturing;2012-02
2. An inverse-flow showerhead MOVPE reactor design;Journal of Crystal Growth;2007-01
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