Growth temperatures and the excess chlorine effect of N-Polar GaN growth via tri-halide vapor phase epitaxy
Author:
Funder
Japan Science and Technology Agency
Publisher
Elsevier BV
Subject
Materials Chemistry,Inorganic Chemistry,Condensed Matter Physics
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1. Thermodynamic analysis of oxide vapor phase epitaxy of GaN;Journal of Applied Physics;2023-08-28
2. A green, low-cost method to prepare GaN films by plasma enhanced chemical vapor deposition;Thin Solid Films;2020-09
3. Growth of Highly Crystalline GaN at High Growth Rate by Trihalide Vapor‐Phase Epitaxy;physica status solidi (b);2020-04
4. Preparing GaN nanowires on Al2O3 substrate without catalyst and its optical property;Acta Physica Sinica;2020
5. Hydride vapor phase epitaxy for gallium nitride substrate;Journal of Semiconductors;2019-10-01
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