The influence of growth temperature on 4H-SiC epilayers grown on different off-angle (0 0 0 1) Si-face substrates

Author:

Yan G.G.,Liu X.F.,Shen Z.W.,Zhao W.S.,Wang L.,Cui Y.X.,Li J.T.,Zhang F.,Sun G.S.,Zeng Y.P.

Funder

Science Challenge Project

National Basic Research Program of China

National Natural Science Foundation of China

Beijing NOVA Program

Beijing Municipal Science and Technology Commission Project

Youth Innovation Promotion Association of CAS

Publisher

Elsevier BV

Subject

Materials Chemistry,Inorganic Chemistry,Condensed Matter Physics

Cited by 4 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

1. Growth of 150 mm 4H-SiC Epilayers with Low Surface Roughness by a Hot-Wall Reactor on 4° off- Axis Substrates;2023 20th China International Forum on Solid State Lighting & 2023 9th International Forum on Wide Bandgap Semiconductors (SSLCHINA: IFWS);2023-11-27

2. Temperature Field Simulation and optimization for Horizontal 6-inch 4H-SiC Epitaxial CVD Reactor by Induction Heating;2023 24th International Conference on Thermal, Mechanical and Multi-Physics Simulation and Experiments in Microelectronics and Microsystems (EuroSimE);2023-04-17

3. Study of the deposition of nanopillar-patterned 4H-SiC by molecular dynamics simulation;Applied Surface Science;2022-03

4. Effect of C/Si ratio on growth of 4H-SiC epitaxial layers on on-axis and 4° off-axis substrates;Journal of Crystal Growth;2020-02

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