Effect of nitrogen flow ratio on the structural and optical properties of aluminum nitride thin films
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Inorganic Chemistry,Condensed Matter Physics
Reference16 articles.
1. Preparation and rapid thermal annealing of AlN thin films grown by molecular beam epitaxy
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3. Influence of sputtering mechanisms on the preferred orientation of aluminum nitride thin films
4. A comparison of pulsed-laser-deposited and ion-beam-enhanced-deposited AlN thin films for SOI application
5. Plasma enhanced metalorganic chemical vapor deposition of amorphous aluminum nitride
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1. Effects of Different Nitrogen Flow Rates on Structure and Optical Characteristics in AlN Films by Reactive Magnetron Sputtering;2023-11-20
2. Nitrogen flow rate dependent atomic coordination, phonon vibration and surface analysis of DC magnetron sputtered nitrogen rich-AlN thin films;Physica B: Condensed Matter;2023-10
3. Preparation of AlN thin film and the impacts of AlN buffer layer on the carrier transport properties of p-NiO/n-InN heterojunction by magnetron sputtering;Materials Science in Semiconductor Processing;2022-04
4. Influence of nitrogen flow ratio on properties of c-axis oriented AlN films grown by RF magnetron sputtering;Applied Physics A;2021-10-06
5. Morphological diversity of AlN nano- and microstructures: synthesis, growth orientations and theoretical modelling;International Materials Reviews;2019-07-29
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