A comparison of pulsed-laser-deposited and ion-beam-enhanced-deposited AlN thin films for SOI application
Author:
Publisher
Elsevier BV
Subject
Mechanical Engineering,Mechanics of Materials,Condensed Matter Physics,General Materials Science
Reference22 articles.
1. Electrical characteristics of metal/AlN/n‐type 6H–SiC(0001) heterostructures
2. Demonstration of a silicon field‐effect transistor using AlN as the gate dielectric
3. Applications of Aluminium Nitride Films Deposited by Reactive Sputtering to Silicon-On-Insulator Materials
4. Fabrication of SOI structure with AlN film as buried insulator by Ion-Cut process
5. A new structure design of a silicon-on-insulator MOSFET reducing the self-heating effect
Cited by 12 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Growth, structural and electrical properties of AlN/Si (111) for futuristic MEMS applications;Materials Science in Semiconductor Processing;2021-03
2. Electrical and structural characteristics of sputtered c-oriented AlN thin films on Si (100) and Si (110) substrates;Thin Solid Films;2018-11
3. Electrical conduction and dielectric relaxation properties of AlN thin films grown by hollow-cathode plasma-assisted atomic layer deposition;Semiconductor Science and Technology;2016-06-06
4. Effect of Film Thickness on the Electrical Properties of AlN Films Prepared by Plasma-Enhanced Atomic Layer Deposition;IEEE Transactions on Electron Devices;2015-11
5. Current transport mechanisms in plasma-enhanced atomic layer deposited AlN thin films;Journal of Applied Physics;2015-04-21
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3