Effect of the target temperature during magnetron sputtering of Nickel
Author:
Publisher
Elsevier BV
Subject
Surfaces, Coatings and Films,Condensed Matter Physics,Instrumentation
Reference30 articles.
1. Sputtering Process and Apparatus;Chapin,1979
2. Magnetron sputtering – Milestones of 30 years
3. A novel pulsed magnetron sputter technique utilizing very high target power densities
4. Tutorial: Reactive high power impulse magnetron sputtering (R-HiPIMS)
5. Discharge physics of high power impulse magnetron sputtering
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