Dependence on gas pressure of μc-Si:H prepared by RF magnetron sputtering
Author:
Publisher
Elsevier BV
Subject
Surfaces, Coatings and Films,Condensed Matter Physics,Instrumentation
Reference12 articles.
1. Complete microcrystallinep‐i‐nsolar cell—Crystalline or amorphous cell behavior?
2. Effect of the hydrogen partial pressure ratio on the properties of μc-Si:H films prepared by rf magnetron sputtering
3. Dependence on substrate temperature of the film structure of μc-Si:H prepared by RF magnetron sputtering
4. Growth mechanism of microcrystalline silicon obtained from reactive plasmas
5. Striganov AR, Sventitskii NS. Tables of spectral lines of neutral and ionized atoms, New York, Washington: IFI/Plenum; 1968.
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1. Interpretation of hydrogen incorporation into radio frequency sputtered amorphous silicon based on Berg modelling;Vacuum;2022-08
2. Effects of ratio of hydrogen flow on microstructure of hydrogenated microcrystalline silicon films deposited by magnetron sputtering at 100 °C;Journal of Central South University;2019-10
3. Nanocrystalline silicon films directly made by pulsed-DC magnetron sputtering;Surface and Coatings Technology;2013-08
4. Effects of hydrogen atmosphere on pulsed-DC sputtered nanocrystalline Si:H films;Materials Research Bulletin;2012-10
5. Room-Temperature Deposition of Silicon Thin Films by RF Magnetron Sputtering;Advanced Materials Research;2012-10
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