Dependence on substrate temperature of the film structure of μc-Si:H prepared by RF magnetron sputtering
Author:
Publisher
Elsevier BV
Subject
Surfaces, Coatings and Films,Condensed Matter Physics,Instrumentation
Reference9 articles.
1. Amorphous and microcrystalline silicon solar cells;Schroop,1998
2. Effect of the hydrogen partial pressure ratio on the properties of μc-Si:H films prepared by rf magnetron sputtering
3. Formation kinetics and control of microcrystallite in μc-Si:H from glow discharge plasma
4. Detailed Study of Si-H Stretching Modes in µc-Si: H Film through Second Derivative IR Spectra
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1. Deuterium trapping in the carbon-silicon co-deposition layers prepared by RF sputtering in D2 atmosphere;Journal of Nuclear Materials;2018-04
2. Crystallization of as-deposited amorphous silicon films on glass prepared by magnetron sputtering with different substrate biases and temperatures;Journal of Crystal Growth;2011-04
3. Film-thickness dependence of structural and electrical properties of boron-doped hydrogenated microcrystalline silicon prepared by radiofrequency magnetron sputtering;Journal of Non-Crystalline Solids;2010-05
4. Corrosion resistance and cytocompatibility of biodegradable surgical magnesium alloy coated with hydrogenated amorphous silicon;Journal of Biomedical Materials Research Part A;2009-06-01
5. Electrical properties of a-Si:H thin films as a function of bonding configuration;Solar Energy Materials and Solar Cells;2009-02
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