Optimization of the two parameters in the deconvolution procedure for obtaining the original in-depth distribution of composition from measured sputter depth profile by genetic algorithm-Reference-Cited by-同舟云学术

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Optimization of the two parameters in the deconvolution procedure for obtaining the original in-depth distribution of composition from measured sputter depth profile by genetic algorithm

Published:2021-02 Issue: Volume:184 Page:109866
ISSN:0042-207X
Container-title:Vacuum
language:en
Short-container-title:Vacuum

Author:

Wang C.L.,Li J.,Liu X.X.,Chen Y.L.,Tan Z.H.,Li H.W.,Yang H.,Lian S.Y.,Wang J.Y.,Xu C.K.

Funder

Shantou University

Optics and Photoelectronics

Publisher

Elsevier BV

Subject

Surfaces, Coatings and Films,Condensed Matter Physics,Instrumentation

Reference13 articles.

1. An analytical expression for describing Auger sputter depth profile shapes of interfaces;Kirchhoff;J. Vac. Sci. Technol.,1986

2. An analytic form for the SIMS response function measured form ultra-thin impurity layers;Dowsett;Surf. Interface Anal.,1994

3. Compositional depth profiling by sputtering;Hofmann;Prog. Surf. Sci.,1991

4. Sputter depth profiling: past, present, and future;Hofmann;Surf. Interface Anal.,2014

5. Deconvolution method for obtaining directly the original in-depth distribution of composition from measured sputter depth profile;Lian;Vacuum,2019

Cited by 2 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Deconvolution of high-resolution depth profiling data with sputtering induced roughness for reconstruction of nano-layer structure;Vacuum;2024-09

2. Optimization of deconvoluted parameter for the quantification of high-resolution SIMS depth profiles;Vacuum;2023-09

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