Sputter depth profiling: past, present, and future-Reference-Cited by-同舟云学术

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Sputter depth profiling: past, present, and future

Published:2014-04-24 Issue:10-11 Volume:46 Page:654-662
ISSN:0142-2421
Container-title:Surface and Interface Analysis
language:en
Short-container-title:Surf. Interface Anal.

Author:

Hofmann S.¹

Affiliation:

1. Max Planck Institute for Intelligent Systems (formerly MPI for Metals Research); Heisenbergstrasse 3 70569 Stuttgart Germany

Publisher

Wiley

Subject

Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry

Link

http://onlinelibrary.wiley.com/wol1/doi/10.1002/sia.5489/fullpdf

Reference79 articles.

1. Quantitative Compositional Depth Profiling

2. ISO ISO 181151: 2010-surface chemical analysis - vocabulary -general terms and terms used in spectroscopy 2010 44

3. VII. On the electro-chemical polarity of gases

4. Controlled Sputtering of Metals by Low-Energy Hg Ions

5. THE ASPECTS OF SPUTTERING IN SURFACE ANALYSIS METHODS

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