Deconvolution method for obtaining directly the original in-depth distribution of composition from measured sputter depth profile
Author:
Funder
Science and Technology Planning Project of Guangdong Province
Publisher
Elsevier BV
Subject
Surfaces, Coatings and Films,Condensed Matter Physics,Instrumentation
Reference32 articles.
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3. Ultimate depth resolution and profile reconstruction in sputter profiling with AES and SIMS;Hofmann;Surf. Interface Anal.,2000
4. Deconvolution method for composition profiling by Auger sputtering technique;Ho;Surf. Sci.,1976
5. An analytical expression for describing Auger sputter depth profile shapes of interfaces;Kirchhoff;J. Vac. Sci. Technol. A,1986
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1. Deconvolution of high-resolution depth profiling data with sputtering induced roughness for reconstruction of nano-layer structure;Vacuum;2024-09
2. Optimization of deconvoluted parameter for the quantification of high-resolution SIMS depth profiles;Vacuum;2023-09
3. Method for extracting the intrinsic diffusion coefficient from grain boundary diffusion depth profile;Journal of Vacuum Science & Technology A;2023-03-07
4. Optimization of the two parameters in the deconvolution procedure for obtaining the original in-depth distribution of composition from measured sputter depth profile by genetic algorithm;Vacuum;2021-02
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