Effects of Ar gas pressure on microstructure of DLC films deposited by high-power pulsed magnetron sputtering
Author:
Publisher
Elsevier BV
Subject
Surfaces, Coatings and Films,Condensed Matter Physics,Instrumentation
Reference19 articles.
1. Deposition of Ti/C nano-composite DLC films by magnetron DC sputtering with dual targets
2. Pressure and plasma effects on the properties of magnetron sputtered carbon films
3. Effects of gas pressure and r.f. power on the growth and properties of magnetron sputter deposited amorphous carbon thin films
4. Influence of the plasma pressure on the microstructure and on the optical and mechanical properties of amorphous carbon films deposited by direct current magnetron sputtering
5. Preparation of various DLC films by T-shaped filtered arc deposition and the effect of heat treatment on film properties
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