Pressure and plasma effects on the properties of magnetron sputtered carbon films-Reference-Cited by-同舟云学术

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Pressure and plasma effects on the properties of magnetron sputtered carbon films

Published:1987-07 Issue:4 Volume:5 Page:2150-2153
ISSN:0734-2101
Container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
language:en
Short-container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films

Author:

Rossnagel S. M.,Russak M. A.,Cuomo J. J.

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Link

http://avs.scitation.org/doi/pdf/10.1116/1.574941

Cited by 46 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. The Role of Amorphous Nanocrystalline Carbon Films in Interference on Flexible Copper Foils;ACS Applied Electronic Materials;2022-02-03

2. Differences in surface reactivity in two synthetic routes between HiPIMS and DC magnetron sputtered carbon;Surface and Coatings Technology;2019-11

3. Highly Reliable Contacts to Silicon Enabled by Low Temperature Sputtered Graphenic Carbon;IEEE Journal of the Electron Devices Society;2019

4. Investigation of parameters of plasma generated by high-power impulse magnetron sputtering (HiPIMS) of graphite;Journal of Physics: Conference Series;2018-11

5. Preparation of nickel-containing conductive amorphous carbon films by magnetron sputtering with negative high-voltage pulsed substrate bias;Thin Solid Films;2018-03

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