Effects of gas pressure and r.f. power on the growth and properties of magnetron sputter deposited amorphous carbon thin films-Reference-Cited by-同舟云学术

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Effects of gas pressure and r.f. power on the growth and properties of magnetron sputter deposited amorphous carbon thin films

Published:2002-03 Issue:3-6 Volume:11 Page:1005-1009
ISSN:0925-9635
Container-title:Diamond and Related Materials
language:en
Short-container-title:Diamond and Related Materials

Author:

Andújar J.L.,Pino F.J.,Polo M.C.,Pinyol A.,Corbella C.,Bertran E.

Publisher

Elsevier BV

Subject

Electrical and Electronic Engineering,Materials Chemistry,Mechanical Engineering,General Chemistry,Electronic, Optical and Magnetic Materials

Reference7 articles.

1. Sputtered carbon on particulate media

2. Chemical, mechanical and tribological characterization of ultra-thin and hard amorphous carbon coatings as thin as 3.5 nm: recent developments

3. Diamondlike amorphous carbon films prepared by magnetron sputtering of graphite

4. Influence of the plasma pressure on the microstructure and on the optical and mechanical properties of amorphous carbon films deposited by direct current magnetron sputtering

5. Pressure and plasma effects on the properties of magnetron sputtered carbon films

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2. Metal-induced growth of graphene/a-C: H composite films and tribological properties;Diamond and Related Materials;2023-03

3. Influencia de la potencia de depósito en la morfología de películas delgadas de óxidos de molibdeno depositadas por el método de sputtering.;Quimica Hoy;2022-09-30

4. Influence of the power density and working pressure in the magnetron co-sputtering deposition of ZnO–SnO2 thin films and their effect in photocatalytic hydrogen production;Optical Materials;2020-12

5. Size and flux of carbon nanoparticles synthesized by Ar+CH4 multi-hollow plasma chemical vapor deposition;Diamond and Related Materials;2020-11

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