Infrared spectroscopic analysis of reactively formed La-silicate interface layer at La 2 O 3 /Si substrates
Author:
Publisher
Elsevier BV
Subject
Surfaces, Coatings and Films,Condensed Matter Physics,Instrumentation
Reference19 articles.
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1. Plasma-enhanced atomic layer-deposited La2O3 ultra-thin films on Si and 6H–SiC: a comparative study;Applied Physics A;2020-07-31
2. Alternate lanthanum oxide/silicon oxynitride-based gate stack performance enhancement due to ultrathin oxynitride interfacial layer for CMOS applications;Journal of Materials Science: Materials in Electronics;2019-12-16
3. Advances in La-Based High-k Dielectrics for MOS Applications;Coatings;2019-03-27
4. Effect of lanthanum silicate interface layer on the electrical characteristics of 4H-SiC metal-oxide-semiconductor capacitors;Microelectronics Reliability;2018-05
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