Effect of bias voltage on microstructure and optical properties of Al2O3 thin films prepared by twin targets reactive high power impulse magnetron sputtering-Reference-Cited by-同舟云学术

Effect of bias voltage on microstructure and optical properties of Al2O3 thin films prepared by twin targets reactive high power impulse magnetron sputtering

Published:2019-08 Issue: Volume:166 Page:88-96
ISSN:0042-207X
Container-title:Vacuum
language:en
Short-container-title:Vacuum

Author:

Zhou Guangxue,Wang Langping,Wang Xiaofeng,Yu Yonghao,Mutzke Andreas

Funder

National Basic Research Program of China

Publisher

Elsevier BV

Subject

Surfaces, Coatings and Films,Condensed Matter Physics,Instrumentation

Reference58 articles.

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3. Ultrathin Al2O3 and AlN films deposited by reactive sputter using advanced electron cyclotron resonance plasma source;Shimada;Vacuum,2000

4. Elaboration, characterization and dielectric properties study of amorphous alumina thin films deposited by rf magnetron sputtering;Segda;Vacuum,2001

5. Tribological and optical properties of crystalline and amorphous alumina thin films grown by low-temperature reactive magnetron sputter-deposition;Wang;Surf. Coating. Technol.,2001

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