Dense Al2o3 Films Prepared by High Power Impulse Magnetron Sputtering at Pulsed Kv Bias-Reference-Cited by-同舟云学术

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Dense Al2o3 Films Prepared by High Power Impulse Magnetron Sputtering at Pulsed Kv Bias

Published:2024 Issue: Volume: Page:
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Author:

Wu Zhongzhen,Yang Dongjie,Liu Yaoyao,Zhang Xiang,Chen Shusheng,Wang Xiaowei,Liao Yu,An Xiaokai,Zhao Yanfei,Chen Lingjie,Cui Suihan,Liu Liangliang,Fu Ricky K. Y.,Chu Paul K.

Publisher

Elsevier BV

Reference27 articles.

1. Nanopattern formation in UV laser treated a-AlO x and nc-Al/AlO x layers;J Sz�v�s;Vacuum,2014

2. Structural, optical and mechanical properties of amorphous and crystalline alumina thin films;P Nayar;Thin Solid Films,2014

3. On the relationship between texture characteristics and residual stress levels: An X-ray diffraction study on ?-Al 2 O 3 hard coatings;P Schoderb�ck;Thin Solid Films,2023

4. Synthesis of AlO x thin films by atmosphericpressure mist chemical vapor deposition for surface passivation and electrical insulator layers;A Rajib;J. Vac. Sci. Technol. A,2020

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