Simulation of the effect of argon pressure on thermal processes in the sputtering unit of a magnetron with a hot target
Author:
Publisher
Elsevier BV
Subject
Surfaces, Coatings and Films,Condensed Matter Physics,Instrumentation
Reference34 articles.
1. Orthorhombic Ta3-xN5-yOy thin films grown by unbalanced magnetron sputtering: the role of oxygen on structure, composition, and optical properties;Chang;Sur. Coat. Technol.,2021
2. Magnetron discharge in an argon–oxygen mixture for deposition of a titanium oxide film;Komlev;Tech. Phys.,2012
3. Microstructure and mechanical properties of (AlCrTiZrV)Nx high-entropy alloy nitride films by reactive magnetron sputtering;Chen;Vacuum,2020
4. Long-term stability and disappearing anode effects during reactive DC and pulsed bipolar magnetron sputtering of Al2O3;Mareš;Vacuum,2019
5. Influence of argon pressure and current density on substrate temperature during magnetron sputtering of hot titanium target;Komlev;Appl. Phys. A,2017
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1. Study of Heat Flow at Substrate during Sputtering of Copper–Titanium Sandwich Target;Materials;2024-07-21
2. Study of Plasma Particle Distribution and Electron Temperature in Cylindrical Magnetron Sputtering;Plasma Chemistry and Plasma Processing;2023-11-17
3. Modeling of Reactive Sputtering—History and Development;Materials;2023-04-20
4. Physicochemical model for reactive sputtering of a sandwich target;Journal of Applied Physics;2023-02-23
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