Influence of argon pressure and current density on substrate temperature during magnetron sputtering of hot titanium target
Author:
Funder
Russian Science Foundation
Publisher
Springer Science and Business Media LLC
Subject
General Materials Science,General Chemistry
Link
http://link.springer.com/article/10.1007/s00339-017-1458-4/fulltext.html
Reference17 articles.
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2. V.I. Shapovalov, Nanopowders and films of titanium oxide for photocatalysis: a review. Glass Phys. Chem 36, 121–157 (2010). https://doi.org/10.1134/S108765961002001X
3. V.I. Shapovalov, A.E. Komlev, V.V. Vit’ko et al., Influence of annealing on the optical properties and chemical and phase compositions of tungsten-oxide films. J. Surf. Investig. X ray Synchrotron Neutron Techniq. 10, 1077–1086 (2016). https://doi.org/10.1134/S1027451016040169
4. V.S. Levitskii, V.I. Shapovalov, A.E. Komlev et al., Raman spectroscopy of copper oxide films deposited by reactive magnetron sputtering. Techn. Phys. Lett. 41, 1094–1096 (2015). https://doi.org/10.1134/S106378501511022X
5. J.A. Thornton, Substrate heating in cylindrical magnetron sputtering sources., Thin Solid Films. 54, 23–31 (1978). https://doi.org/10.1016/0040-6090(78)90273-0
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