Stability and process parameter optimization for a vertical rotating ZnO-MOCVD reaction chamber-Reference-Cited by-同舟云学术

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Stability and process parameter optimization for a vertical rotating ZnO-MOCVD reaction chamber

Published:2018-03 Issue: Volume:149 Page:60-68
ISSN:0042-207X
Container-title:Vacuum
language:en
Short-container-title:Vacuum

Author:

Li Jian,Xu Yi-feng,Ma Xue-jin,Fan Bing-feng,Wang Gang

Funder

National Natural Science Funds for the Natural Funds of Guangdong Province

National Supercomputing Center (NSCC) in Guangzhou

Publisher

Elsevier BV

Subject

Surfaces, Coatings and Films,Condensed Matter Physics,Instrumentation

Reference56 articles.

1. Ultraviolet spontaneous and stimulated emissions from ZnO microcrystallite thin films at room temperature;Zu;Solid State Commun.,1997

2. Will UV lasers beat the blues?;Service;Science,1997

3. Fabrication and optoelectronic properties of a transparent ZnO homostructural light-emitting diode;Guo;Jpn. J. Appl. Phys. Part 2-Letters,2001

4. Near-UV emitting diodes based on a transparent p-n Junction composed of heteroepitaxially grown p-SrCu2O2 and n-ZnO;Hosono;J. Cryst. Growth,2002

5. Fabrication and charaterization of n-ZnO/p-ALGaN heterojunction light-emitting diodes on 6H-SiC substrates;Alivov;Appl. Phys. Latters,2003

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