Influence of Porous Media and Substrate Rotation on Aln Deposition in Mnvpe Reactors Based on Cfd Simulations

Author:

Chen Guifeng,Song Yuxuan,Zhang Hui,Gao Nan,Li Chaoyuan,Xie Xinjian,Bian Li-Feng,Fang Yulong

Publisher

Elsevier BV

Reference29 articles.

1. Low dislocation density AlN on sapphire prepared by double sputtering and annealing;D Wang;Applied Physics Express,2020

2. Investigation of hydride vapor phase epitaxial growth of AlN on sputtered AlN buffer layers[J];J Huang;Crystengcomm,2019

3. Power Enhancement of 265 nm DUV-LED Flip-Chip by HVPE-AlN High-Temperature Annealing;K Yue;Micromachines,2023

4. Effects of argon/nitrogen sputtering gas on the microstructural, crystallographic and piezoelectric properties of AlN thin films;Abd Samad;Scripta Materialia,2023

5. Effects of substrate pretreatment and annealing processes on AlN thin films prepared by EVPE[J];L Xie;Materials Science In Semiconductor Processing,2022

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