Hysteresis-free deposition of TiOxNy thin films: Effect of the reactive gas mixture and oxidation of the TiN layers on process control
Author:
Funder
FAPESP
CAPES
CNPq
PRONEX
Publisher
Elsevier BV
Subject
Surfaces, Coatings and Films,Condensed Matter Physics,Instrumentation
Reference29 articles.
1. Role of nitrogen in the formation of hard and elasticCNxthin films by reactive magnetron sputtering
2. Effect of nitrogen doping on TiOxNythin film formation at reactive high-power pulsed magnetron sputtering
3. Reactive sputter deposition of TiN layers: modelling the growth by characterization of particle fluxes towards the substrate
4. Unbalanced magnetic field configuration: plasma and film properties
5. Fundamental understanding and modeling of reactive sputtering processes
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