Unbalanced magnetic field configuration: plasma and film properties
Author:
Publisher
IOP Publishing
Subject
Condensed Matter Physics,General Materials Science
Link
http://stacks.iop.org/0953-8984/18/i=32/a=S02/pdf
Reference44 articles.
1. Charged particle fluxes from planar magnetron sputtering sources
2. The influence of the ion bombardment on the optical properties of TiNx and ZrNx coatings
3. The influence of magnetron configuration on ion current density and deposition rate in a dual unbalanced magnetron sputtering system
4. Low energy ion assist during deposition — an effective tool for controlling thin film microstructure
5. Development of a novel structure zone model relating to the closed-field unbalanced magnetron sputtering system
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